MKS EDGE3013A发电机 PDF资料 

1.产 品 资 料 介 绍：

中文资料：

MKS EDGE3013A 发生器（RF Generator）是一款 13.56MHz 射频功率发生器，主要用于 精密等离子体处理和半导体制造 等高端工业应用。其主要应用领域包括：

1. 半导体制造

• 等离子体蚀刻（Plasma Etching）：用于精细图形化加工，如刻蚀硅片、金属或介质层。
• 化学气相沉积（CVD/PECVD）：支持薄膜沉积，提高膜层质量和均匀性。
• 离子注入（Ion Implantation）：通过 RF 控制等离子体，实现离子掺杂过程。

2. 太阳能光伏（Photovoltaics）

• 薄膜太阳能电池制造：如硅薄膜（a-Si）、CIGS、CdTe等光伏电池的等离子体增强沉积（PECVD）。
• 晶硅太阳能电池蚀刻和表面钝化：提高光吸收效率和转换效率。

3. 显示面板制造（Flat Panel Display, FPD）

• 液晶显示（LCD）、有机发光二极管（OLED） 生产中薄膜沉积和刻蚀。
• AMOLED 和 Micro-LED 生产过程中的精密刻蚀及图形化。

4. LED & 微电子制造

• 用于 LED 制造过程中的等离子体蚀刻、PECVD 和干法刻蚀工艺，确保高效能和高精度的 LED 芯片加工。

5. 先进材料处理

• 等离子体表面改性：改变材料表面能，提高附着力和润湿性（如医疗设备涂层、航空航天材料处理）。
• 纳米材料处理：用于碳纳米管（CNT）、石墨烯等先进材料的合成和修饰。

6. 医疗和生物技术

• 生物材料表面改性：优化生物传感器、植入物、微流体器件等材料的生物相容性。
• 医疗设备制造：如透析膜、导管等的等离子表面处理，提高性能。

7. 工业镀膜

• 功能性涂层：如防指纹涂层、防反射涂层、硬化涂层，应用于玻璃、塑料和金属表面处理。
• 光学镀膜：用于滤光片、激光元件、眼镜片制造。

8. 通信 & 电子元件

• RF MEMS 生产：用于制造高性能射频微机电系统（RF MEMS），应用于 5G、卫星通信等领域。
• PCB 制造：高密度互连（HDI）PCB 生产中的等离子清洁和刻蚀。

MKS EDGE3013A 作为高稳定性射频电源，提供精准的功率控制和稳定的射频输出，广泛应用于 半导体、光伏、显示面板、LED 及高科技材料制造等行业。

英文资料：

The MKS EDGE3013A RF Generator is a 13.56MHz RF power generator primarily used for high-end industrial applications such as precision plasma processing and semiconductor manufacturing. Its main application areas include:

1. Semiconductor manufacturing

Plasma Etching: Used for fine graphic processing, such as etching silicon wafers, metals, or dielectric layers.

Chemical Vapor Deposition (CVD/PECVD): supports thin film deposition to improve film quality and uniformity.

Ion implantation: The process of ion doping is achieved by controlling the plasma through RF.

2. Solar photovoltaics

Manufacturing of thin-film solar cells: plasma enhanced deposition (PECVD) of photovoltaic cells such as silicon thin films (a-Si), CIGS, CdTe, etc.

Etching and surface passivation of crystalline silicon solar cells: improving light absorption efficiency and conversion efficiency.

3. Manufacturing of Flat Panel Display (FPD)

Thin film deposition and etching in the production of liquid crystal displays (LCDs) and organic light-emitting diodes (OLEDs).

Precision etching and patterning in the production process of AMOLED and Micro LED.

4. LED&Microelectronics Manufacturing

Used for plasma etching, PECVD, and dry etching processes in LED manufacturing to ensure efficient and high-precision processing of LED chips.

5. Advanced material processing

Plasma surface modification: Changing the surface energy of materials to improve adhesion and wettability (such as medical equipment coatings, aerospace material processing).

Nanomaterial processing: used for the synthesis and modification of advanced materials such as carbon nanotubes (CNTs) and graphene.

6. Medical and Biotechnology

Surface modification of biomaterials: optimizing the biocompatibility of materials such as biosensors, implants, microfluidic devices, etc.

Medical equipment manufacturing: plasma surface treatment of dialysis membranes, catheters, etc. to improve performance.

7. Industrial coating

Functional coatings: such as anti fingerprint coatings, anti reflective coatings, and hardened coatings, applied to surface treatment of glass, plastic, and metal.

Optical coating: used in the manufacturing of optical filters, laser components, and eyeglass lenses.

8. Communication&Electronic Components

RF MEMS production: used for manufacturing high-performance RF microelectromechanical systems (RF MEMS), applied in fields such as 5G and satellite communication.

PCB manufacturing: plasma cleaning and etching in high-density interconnect (HDI) PCB production.

As a highly stable RF power supply, MKS EDGE3013A provides precise power control and stable RF output, and is widely used in industries such as semiconductors, photovoltaics, display panels, LEDs, and high-tech material manufacturing.

2.产      品      展      示      

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