AMAT 1007-0013物理气相沉积（PVD）设备
1.产 品 资 料 介 绍：
中文资料：
AMAT 1007-0013是一种物理气相沉积（PVD）设备，用于制造微电子、光电子和纳米技术领域的薄材料。
该设备具有高度可控制的沉降过程，可用于制造具有高质量、均衡性和可再生性的薄膜。AMAT 1007-0013还有高效的响应器具设计，可提供高产量和低产量。
该设备主要应用于半导体、太阳能电池、涂料层、LED等领域。它可以制造金属、合金、氧化物质、氧化物质、碳化物质等各种类型材料薄膜，从而满足各种应用的需求。
AMAT 1007-0013的主要特点包：
- 高度可控的沉积过程
- 高效的反应器设计
- 生产效率高
- 生产成本低
总之，AMAT 1007-0013是一款高性能的物理空气沉积设备，具有广泛的应用前景。
英文资料：
AMAT 1007-0013 is a physical vapor deposition (PVD) device used to manufacture thin materials in the fields of microelectronics, optoelectronics, and nanotechnology.
This device has a highly controllable settling process and can be used to manufacture films with high quality, balance, and renewability. AMAT 1007-0013 also has an efficient response device design that can provide high and low yields.
This device is mainly used in fields such as semiconductors, solar cells, coating layers, and LEDs. It can manufacture films of various types of materials such as metals, alloys, oxidizing substances, oxidizing substances, and carbonizing substances to meet the needs of various applications.
The main features of AMAT 1007-0013 include:
Highly controllable deposition process
Efficient reactor design
High production efficiency
Low production cost
In summary, AMAT 1007-0013 is a high-performance physical air deposition device with broad application prospects.
2.产 品 展 示
3.主 营 品 牌
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