Gasonics 12-300000-30微波电源模块 PDF资料
1.产 品 资 料 介 绍：
Gasonics 12-300000-30 微波电源模块 是一款专用于 Gasonics 等离子体剥离系统的高频功率发生与控制组件，主要负责为等离子反应腔体提供稳定、精确的微波能量，以实现高效、均匀的等离子体激发与维持。该模块是等离子体处理系统中的关键核心部件之一。
一、产品概述
产品名称：Microwave Power Module / 微波电源模块
部件编号：12-300000-30
适用设备：Gasonics PEP/Aura 等离子体剥离系统
功能定位：提供微波激励功率（通常为 2.45 GHz），驱动反应腔产生等离子体
该模块通常用于 Gasonics 采用微波等离子体源的系统中，如 Aura 3000 系列或高功率型剥离设备。
二、主要技术功能
| 功能分类 | 描述 |
|---|---|
| 微波功率输出 | 产生稳定的 2.45GHz 高频功率，一般功率范围为 600W–1200W（具体取决于设备型号） |
| 功率调控功能 | 支持自动功率调节、脉冲调制（Pulse Mode）或恒定输出模式（CW Mode） |
| 与控制系统通信 | 可接收主控系统发送的启动、功率设定等控制信号 |
| 保护机制 | 具备过热、反射功率过高、电压异常等故障自检与保护功能 |
三、典型应用场景
| 应用位置 | 说明 |
|---|---|
| 等离子体腔体激励源 | 微波电源通过波导或天线将能量耦合至处理腔体，产生等离子体 |
| 高分子剥离/灰化处理 | 适用于光刻胶去除、腔体清洗等工艺，对热敏感器件影响小 |
| 低损耗材料加工 | 微波激发的等离子体温度较低，适合先进晶圆材料工艺（如低k介质） |
英文资料：
The Gasonics 12-300000-30 microwave power module is a high-frequency power generation and control component specifically designed for Gasonics plasma stripping systems. It is mainly responsible for providing stable and accurate microwave energy to the plasma reaction chamber to achieve efficient and uniform plasma excitation and maintenance. This module is one of the key core components in the plasma processing system.
1、 Product Overview
Product Name: Microwave Power Module
Part number: 12-300000-30
Applicable equipment: Gasonics PEP/Aura plasma stripping system
Functional positioning: Provide microwave excitation power (usually 2.45 GHz) to drive the reaction chamber to generate plasma
This module is typically used in Gasonics systems that use microwave plasma sources, such as the Aura 3000 series or high-power stripping equipment.
2、 Main technical functions
Functional classification description
Microwave power output generates stable high-frequency power of 2.45GHz, with a general power range of 600W-1200W (depending on the device model)
The power regulation function supports automatic power regulation, pulse mode, or constant output mode (CW mode)
Communication with the control system can receive control signals such as startup and power setting sent by the main control system
The protection mechanism has self checking and protection functions for faults such as overheating, high reflected power, and abnormal voltage
3、 Typical application scenarios
Application Location Description
Plasma cavity excitation source microwave power couples energy to the processing cavity through waveguide or antenna, generating plasma
Polymer exfoliation/ashing treatment is suitable for processes such as photoresist removal and cavity cleaning, with minimal impact on heat sensitive devices
The plasma temperature excited by microwave in low loss material processing is relatively low, making it suitable for advanced wafer material processes (such as low-k media)
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