Tokyo Electron 2L39-000039-25自动匹配器 PDF资料
1.产 品 资 料 介 绍:
中文资料:
Tokyo Electron 2L39-000039-25 自动匹配器(Automatic Matching Network) 是半导体制造设备中用于射频(RF)系统的关键模块,主要功能是自动调整射频功率源与负载之间的阻抗匹配,以优化射频能量传输效率,保证工艺稳定性和设备安全。
一、产品功能定位
模块类型:自动阻抗匹配网络
主要功能:
实时检测负载阻抗变化,自动调节匹配电路参数;
最大限度减少反射功率,提升射频传输效率;
保护射频功率源,防止过载和故障;
支持多种射频功率级别,满足不同工艺需求。
二、主要应用领域
1. 等离子体蚀刻设备
保持等离子体稳定,提升蚀刻均匀性;
自动适应工艺气体及腔体变化带来的阻抗波动。
2. 化学气相沉积(CVD)和物理气相沉积(PVD)设备
优化射频能量输入,提高薄膜质量和一致性;
支持多工艺参数切换,提升生产灵活性。
3. 等离子增强工艺(PECVD、RIE)
实现快速自动匹配,减少设备调试时间;
提升设备运行效率和稳定性。
英文资料:
The Tokyo Electron 2L39-000039-25 Automatic Matching Network is a key module used in semiconductor manufacturing equipment for radio frequency (RF) systems. Its main function is to automatically adjust the impedance matching between the RF power source and the load to optimize RF energy transfer efficiency, ensure process stability and equipment safety.
1、 Product functional positioning
Module type: Automatic impedance matching network
Main functions:
Real time detection of load impedance changes and automatic adjustment of matching circuit parameters;
Minimize reflected power and improve RF transmission efficiency to the greatest extent possible;
Protect the RF power source to prevent overload and malfunction;
Support multiple RF power levels to meet different process requirements.
2、 Main application areas
1. Plasma etching equipment
Maintain plasma stability and improve etching uniformity;
Automatically adapt to impedance fluctuations caused by process gas and chamber changes.
2. Chemical vapor deposition (CVD) and physical vapor deposition (PVD) equipment
Optimize RF energy input to improve film quality and consistency;
Support multi process parameter switching to enhance production flexibility.
3. Plasma enhanced processes (PECVD, RIE)
Realize fast automatic matching and reduce equipment debugging time;
Improve equipment operation efficiency and stability.
2.产 品 展 示
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