Tokyo Electron CPC-T00001A-13分析模块 PDF资料
1.产 品 资 料 介 绍：
中文资料：
Tokyo Electron (TEL) CPC-T00001A-13 分析模块 — 产品应用领域详解
一、产品功能定位
CPC-T00001A-13 分析模块是 Tokyo Electron 半导体设备系统中的过程监控与参数分析组件，主要用于采集、分析并反馈关键工艺数据，辅助实现设备运行过程的闭环控制与质量保障。
该模块可能结合气体监测、等离子体状态、电源波形、温度、真空度等多种参数的实时分析，用于优化制程、提高设备良率与生产稳定性。
二、主要应用领域
1. 半导体工艺过程监控与分析
典型应用设备：
等离子刻蚀系统（Etcher）
薄膜沉积系统（CVD、ALD、PVD）
晶圆清洗与表面处理设备
真空腔体工艺设备
主要监测对象：
等离子体状态监控：发光强度、频谱、放电电流变化等；
工艺气体状态分析：通过连接气体传感器或残余气体分析器（RGA）；
功率/频率反馈：监测射频功率变化对等离子体稳定性的影响。
2. 闭环工艺控制系统的数据源
与主控系统联动：分析模块的数据作为控制逻辑输入，指导系统进行温度调节、气体流量调控、功率匹配调整；
提升稳定性与重现性：通过监控波动趋势，实现参数自适应优化；
异常侦测与报警：可捕捉异常偏离，如过压、等离子体失效、气体混合异常等，触发联动报警与保护动作。
英文资料：
Tokyo Electron (TEL) CPC-T00001A-13 Analysis Module - Detailed Explanation of Product Application Fields
1、 Product functional positioning
The CPC-T00001A-13 analysis module is a process monitoring and parameter analysis component in the Tokyo Electron semiconductor equipment system. It is mainly used to collect, analyze, and provide feedback on key process data, assisting in achieving closed-loop control and quality assurance of equipment operation processes.
This module may combine real-time analysis of various parameters such as gas monitoring, plasma state, power waveform, temperature, vacuum degree, etc., to optimize the process, improve equipment yield and production stability.
2、 Main application areas
1. Semiconductor process monitoring and analysis
Typical application devices:
Plasma etching system (Etcher)
Thin film deposition systems (CVD, ALD, PVD)
Wafer cleaning and surface treatment equipment
Vacuum chamber process equipment
Main monitoring objects:
Plasma state monitoring: changes in luminescence intensity, spectrum, discharge current, etc;
Process gas state analysis: by connecting gas sensors or residual gas analyzers (RGA);
Power/frequency feedback: monitoring the impact of RF power changes on plasma stability.
2. Data source for closed-loop process control system
Linkage with the main control system: Analyze module data as control logic input to guide the system in temperature regulation, gas flow regulation, and power matching adjustment;
Improve stability and reproducibility: By monitoring fluctuation trends, achieve parameter adaptive optimization;
Abnormal detection and alarm: It can capture abnormal deviations, such as overpressure, plasma failure, gas mixing abnormalities, etc., and trigger linkage alarms and protection actions.
2.产 品 展 示
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