KLA Tencor 710-658177-20处理器模块 PDF资料
1.产 品 资 料 介 绍:
中文资料:
KLA Tencor 710-658177-20 处理器模块
KLA Tencor 710-658177-20 是一款用于晶圆检测系统中的处理器控制模块,常见于 KLA Tencor 的 2132/2135 系列等表面缺陷检测设备中,主要用于控制扫描系统中 X 轴的移动与同步,是整个图像采集与处理流程中的核心部件之一。
主要功能:
控制晶圆平台在 X 轴方向的精准运动;
负责实时位置插值计算,实现亚微米级运动控制;
与图像采集系统协同运作,保证检测过程同步稳定;
执行与运动控制、位置反馈、扫描时序等相关的核心处理任务。
应用领域:
半导体制造中的晶圆缺陷检测;
光学与电子束图像系统的位置控制;
高精度扫描检测平台的核心控制单元;
KLA Tencor 表面检测系统中的关键运动控制模块。
产品信息:
型号:710-658177-20
类型:X-Interpolator Phase 3 处理器模块
安装位置:位于检测设备主机内部控制区
适配系统:如 KLA Tencor 2132 系列 200mm 缺陷检测平台
工作方式:与主控制器、编码器接口、运动驱动电路协同运行
英文资料:
KLA Tencor 710-658177-20 processor module
KLA Tencor 710-658177-20 is a processor control module used in wafer inspection systems, commonly found in surface defect detection equipment such as KLA Tencor's 2132/2135 series. It is mainly used to control the movement and synchronization of the X-axis in scanning systems and is one of the core components in the entire image acquisition and processing process.
Main functions:
Control the precise movement of the wafer platform in the X-axis direction;
Responsible for real-time position interpolation calculation and achieving sub micron level motion control;
Collaborate with the image acquisition system to ensure synchronous and stable detection process;
Execute core processing tasks related to motion control, position feedback, scanning timing, etc.
Application areas:
Wafer defect detection in semiconductor manufacturing;
Position control of optical and electron beam imaging systems;
The core control unit of high-precision scanning and detection platform;
The key motion control module in the KLA Tencor surface inspection system.
Product information:
Model: 710-658177-20
Type: X-Interpolator Phase 3 processor module
Installation location: located in the internal control area of the detection device host
Adaptation system: such as KLA Tencor 2132 series 200mm defect detection platform
Working mode: Coordinated operation with the main controller, encoder interface, and motion drive circuit
2.产 品 展 示
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