MKS AX7695PSK-10远程等离子源 PDF资料
1.产 品 资 料 介 绍:
中文资料:
MKS AX7695PSK-10 是一款高性能远程等离子源,广泛应用于半导体、显示面板和太阳能电池制造中的表面处理和清洁工艺。
主要特点:
- 高效等离子解离:能够在 1 至 10 托(Torr)范围内提供超过 95% 的气体解离率,提高工艺效率。
- 高流量处理能力:支持高达 6.0 slm(标准升每分钟)的气体流量,适用于高流量工艺需求。
- 集成式设计:内置石英真空腔室和射频电源,结构紧凑,便于直接安装在工艺腔室上。
- 多气体兼容性:可处理 O₂、N₂、H₂、H₂O 等多种气体,适用于化学气相沉积(CVD)、刻蚀、去胶等工艺。
- 智能控制:支持模拟和 EtherCAT 通信,便于集成到自动化控制系统中,实现精准控制。
应用领域:
- 半导体制造:用于晶圆表面的高密度等离子体处理,提高刻蚀和沉积工艺的均匀性。
- 平板显示器生产:用于清洁和表面改性,提高显示器制造良率。
- 太阳能电池制造:增强太阳能电池的表面处理工艺,提高光电转换效率。
MKS AX7695PSK-10 以其高效、可靠的性能,成为现代高端制造行业中关键的等离子源设备之一。
英文资料:
MKS AX7695PSK-10 is a high-performance remote plasma source widely used in surface treatment and cleaning processes in semiconductor, display panel, and solar cell manufacturing.
Main features:
Efficient plasma dissociation: capable of providing over 95% gas dissociation rate in the range of 1 to 10 Torr, improving process efficiency.
High flow processing capability: Supports gas flow rates up to 6.0 slm (standard liters per minute), suitable for high flow process requirements.
Integrated design: Built in quartz vacuum chamber and RF power supply, compact structure, easy to install directly on the process chamber.
Multi gas compatibility: capable of handling various gases such as O ₂, N ₂, H ₂, H ₂ O, etc., suitable for chemical vapor deposition (CVD), etching, de gluing and other processes.
Intelligent control: Supports simulation and EtherCAT communication, making it easy to integrate into automation control systems and achieve precise control.
Application areas:
Semiconductor manufacturing: used for high-density plasma treatment of wafer surfaces to improve the uniformity of etching and deposition processes.
Flat panel display production: used for cleaning and surface modification to improve display manufacturing yield.
Solar cell manufacturing: Enhance the surface treatment process of solar cells to improve the photoelectric conversion efficiency.
MKS AX7695PSK-10 has become one of the key plasma source equipment in modern high-end manufacturing industry due to its efficient and reliable performance.
2.产 品 展 示
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