APPLIED MATERIALS 0010-44213晶圆提升组件 PDF资料
1.产 品 资 料 介 绍:
中文资料:
Applied Materials 0010-44213 晶圆提升组件 是半导体设备中的关键组件,用于支持晶圆的搬运、提升和精确定位。这种组件通常应用于晶圆处理系统,如化学气相沉积(CVD)、物理气相沉积(PVD)、离子注入以及蚀刻设备中,确保晶圆在加工过程中的高精度和稳定性。
产品概述
- 型号:0010-44213
- 品牌:Applied Materials
- 产品类型:晶圆提升组件
- 主要功能:实现晶圆在半导体设备内部的稳定提升、搬运和位置调整,支持精准工艺操作。
主要特点
高精度控制:
- 支持亚微米级精度,确保晶圆定位的可靠性。
- 减少晶圆在提升或移动过程中的偏移和损伤。
耐用材料:
- 使用高强度、低摩擦材料制造,耐高温、耐腐蚀,适用于苛刻的半导体加工环境。
- 延长组件使用寿命,降低维护成本。
稳定性强:
- 专为高频率使用设计,提供平稳的提升和下降运动。
- 适用于多种尺寸晶圆(通常支持 200mm 和 300mm 晶圆)。
模块化设计:
- 便于集成到多种 Applied Materials 的半导体设备中。
- 支持快速更换和维护,减少设备停机时间。
兼容性强:
- 与 Applied Materials 的各类晶圆处理设备兼容,如 Etch、PVD、CVD 系统等。
技术参数
- 支持晶圆尺寸:200mm 或 300mm 晶圆(具体视型号和配置而定)。
- 操作环境:
- 温度范围:耐高温环境,通常在 150°C - 450°C 之间工作。
- 真空兼容性:支持高真空条件下运行。
- 材料:抗热冲击陶瓷或特种合金,表面经过特殊涂层处理,减少颗粒生成。
- 动作控制:支持线性提升或旋转运动,具体取决于设备配置。
应用场景
晶圆搬运:
- 支持从传送装置到工艺腔体的晶圆转移,确保高效、精准的处理流程。
晶圆加工:
- 在蚀刻、薄膜沉积、氧化等工艺中,将晶圆提升至工艺位置并保持稳定。
自动化晶圆生产线:
- 用于支持全自动化晶圆生产线的运输和处理系统,提升生产效率。
优势
- 高可靠性:设计用于长期高负荷运行,性能稳定且维护需求低。
- 易集成性:与 Applied Materials 的主流设备完美兼容,安装和使用方便。
- 低污染风险:优化的材料和设计减少颗粒污染风险,确保高良率晶圆加工。
英文资料:
The Applied Materials 0010-44213 wafer lift module is a critical component in semiconductor equipment, used to support wafer handling, lifting, and precise positioning. This type of component is commonly used in wafer processing systems such as chemical vapor deposition (CVD), physical vapor deposition (PVD), ion implantation, and etching equipment to ensure high precision and stability of the wafer during processing.
Product Overview
Model: 0010-44213
Brand: Applied Materials
Product type: Wafer lifting component
Main function: To achieve stable lifting, handling, and position adjustment of wafers inside semiconductor equipment, supporting precise process operations.
main features
High precision control:
Support sub micron level accuracy to ensure the reliability of wafer positioning.
Reduce the offset and damage of wafers during lifting or movement.
Durable materials:
Made of high-strength, low friction materials, resistant to high temperatures and corrosion, suitable for harsh semiconductor processing environments.
Extend the service life of components and reduce maintenance costs.
Strong stability:
Specially designed for high-frequency use, providing smooth lifting and lowering movements.
Suitable for various sizes of wafers (usually supporting 200mm and 300mm wafers).
Modular design:
Easy to integrate into semiconductor devices of various Applied Materials.
Support quick replacement and maintenance, reducing equipment downtime.
Strong compatibility:
Compatible with various wafer processing equipment from Applied Materials, such as Etch, PVD, CVD systems, etc.
technical parameter
Supporting wafer size: 200mm or 300mm wafers (depending on model and configuration).
Operating environment:
Temperature range: Resistant to high temperature environments, typically operating between 150 ° C and 450 ° C.
Vacuum compatibility: Supports operation under high vacuum conditions.
Material: Heat shock resistant ceramic or special alloy, surface treated with special coating to reduce particle formation.
Action control: Supports linear lifting or rotational motion, depending on device configuration.
Application scenarios
Wafer handling:
Support wafer transfer from the transfer device to the process chamber, ensuring efficient and precise processing flow.
Wafer processing:
In processes such as etching, thin film deposition, and oxidation, raise the wafer to the process position and maintain stability.
Automated wafer production line:
Used to support the transportation and processing system of fully automated wafer production lines, improving production efficiency.
advantage
High reliability: designed for long-term high load operation, with stable performance and low maintenance requirements.
Easy integration: Perfectly compatible with mainstream equipment from Applied Materials, easy to install and use.
Low pollution risk: Optimized materials and designs reduce the risk of particle contamination, ensuring high yield wafer processing.
2.产 品 展 示
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